 |
|||
         |
|
  sp3 Diamond Technologies is the market leader in wide-area diamond deposition, thanks to our proprietary hot-filament and DC torch chemical vapor deposition (CVD) technology, which enables growth of wafer scale diamond coatings on a wide variety of substrate materials or free-standing thick-film diamond.
CVD is a method of producing diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in crystalline form. CVD diamond growth typically occurs under low pressure, and involves feeding varying amounts of methane and hydrogen gases into a chamber, energizing them and providing conditions for diamond growth on the substrate. sp3's hot filament, or DC torch, energy source generates the environment in which the gases are broken down and more complex chemistries occur. Using CVD, available in sp3's Model 650 Hot Filament Reactor, for diamond growth offers many advantages over competing methods, including the ability to grow diamond over large areas, the ability to more easily grow diamond on substrates so that it adheres and the control over the properties of the diamond produced.
Click here for information about sp3's Model 650 Hot Filament Reactor.  |
|
 |
||
|
|
|
|